RIE Plasma Photoresist Remove Machine
PASMA Removal of Photoresist in semiconductor industry Overall Solution
RIE PLASMA Remove Photoresist Machine
Silicon carbide etching
Surface cleaning after etching
DESCUM
Hard mask layer, dry removal
Silicon oxide or silicon nitride etching
Removal of optical resistance between media
Surface residue removal
PLASMA source
RF
Power
ICP
_
BIAS
1000W(option)
Applicable scope
4~8 inch
Single processing slice count
1
Appearance dimensions
850mmx900mmx1850mm
System control
PLC
Automation level
Manual
5.0
like
design customization
Please fill out the form below to request a quote or to request more information about us. Please be sure to upload customized requirement documents or pictures, and we will get back to you as soon as possible with a response. we're ready to start working on your new project, contact us now to get started.
Please fill out the form below to request a quote or to request more information about us. please be as detailed as possible in your message, and we will get back to you as soon as possible with a response. we're ready to start working on your new project, contact us now to get started.
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