ICP Plasma Photoresist Removal (PR) machine
ICP Plasma
Application:
ASHING
Polymer removal
Dry removal of hard mask layer
Photoresistance removal after ion implantation
Photoresistance removal in BAW/SAW process
Dry cleaning of anti reflective graphic film layer
Surface residue removal
Surface cleaning after etching
DESCUM
|
PLASMA SOURCE |
RF |
RF |
|
|
Power
|
ICP |
1000w |
1000w |
|
BIAS
|
600w(option) |
600w(option) |
|
|
Applicable scope |
4~8inch |
4~8inch |
|
|
Single processing slice count |
1 |
2 |
|
|
Appearance dimensions |
1080x1840x1800mm |
1340x2050x1800mm |
|
|
System control |
Industrial control system |
Industrial control system |
|
|
Automation level |
automatic |
automatic |
|
5.0
like
design customization
Please fill out the form below to request a quote or to request more information about us. Please be sure to upload customized requirement documents or pictures, and we will get back to you as soon as possible with a response. we're ready to start working on your new project, contact us now to get started.
Please fill out the form below to request a quote or to request more information about us. please be as detailed as possible in your message, and we will get back to you as soon as possible with a response. we're ready to start working on your new project, contact us now to get started.
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