Rapid Thermal Processing / Desktop RTP

Provide reliable RTP equipment for compound semiconductors、SlC、LED and MEMS

 Industry applications

l  Oxide, nitride growth

l  Ohmic contact rapid alloy

l  Annealing of silicide alloy

l  Oxidation reflux

l  Gallium arsenide process

l  Other rapid heat treatment processes

Desktop RTP Rapid Thermal Processing

Feature：

l  Infrared halogen lamp tube heating, cooling using air cooling;

l  PlD temperature control for lamp power, which can accurately control temperature rise, ensuring good reproducibility and temperature uniformity;

l  The inlet of the material is set on the WAFER surface to avoid cold point production during the annealing process and ensure good temperature uniformity of the product;

l  Both atmospheric and vacuum treatment methods can be selected, with pre-treatment and purification of the body;

l  Two sets of process gases are standard and can be expanded to up to 6 sets of process gases;

l  The maximum size of a measurable single crystal silicon sample is 12inches(300x300MM);

l  The three safety measures of safe temperature opening protection, temperature controller opening permission protection, and equipment emergency stop safety protection are fully implemented to ensure the safety of the instrument;