MDTFC80 Wafer Two fluid cleaning machine
MDTFC80 Wafer Two fluid cleaning machine
1.Vacuum adsorption and centrifugal force positioning fixation
2.Equipped with ion fan
3.Rocker arm swing speed swing amplitude can be adjusted
4.Secondary Password Management
5.5 sets of cleaning parameters can be set
6.Can be customized according to demand
|
Model |
MDTFC80 |
MDTFC120 |
|
Maximum work piece size |
6″＆8″ |
12″ |
|
Cleaning method |
Water & air two-fluid cleaning |
Water & air two-fluid cleaning |
|
Worktable rotation speed |
3000rpm |
2800rpm |
|
Control system |
PLC |
PLC |
|
Human-computer interaction interface |
Touch screen |
Touch screen |
|
feeding system |
Manual feeding |
Manual feeding |
|
Workpiece holding |
Microporous ceramic vacuum chuck |
Microporous ceramic vacuum chuck |
|
Power supply |
AC220V,10A |
AC220V,10A |
|
Water supply |
Purified water，pressure:0.2-0.4Mpa |
Purified water，pressure:0.2-0.4Mpa |
|
Water flow |
1.5L/min |
1.5L/min |
|
Nitrogen |
0.3-0.4Mpa |
0.3-0.4Mpa |
|
Gas supply |
0.6Mpa Cleaned compressed air |
0.6Mpa Cleaned compressed air |
|
Machine dimensions |
410mm*610mm*1410mm |
600mm*680mm*1800mm |
|
Net weight |
160kg |
140kg |
