MDPS-560 Pyriform Double Chamber Sputtering System
Used for preparing single/multi-layer functional nanofilms including various hard, metallic, semiconducting and dielectric films for universities and science institutions.
Sputtering vacuum chamber, magnetron sputtering target, water-cooling substrate heating turntable, sample injection chamber, sample chamber, annealer, backwash target, magnet sample send mechanism, gas circuit, pumping system, vacuum measurement system, electrical control system and mounting base.
Key Technical Parameters
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Type |
MDPS-560 II |
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Main Sputtering Chamber |
pyriform vacuum chamber, size:Φ560×350mm |
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Sample Injection Chamber |
cylindrical and horizontal type, size: Φ250mm×420mm |
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Pumping System |
independent compound molecular pump and mechanical pump set for main sputtering chamber and sample injection chamber. |
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Ultimate Vacuum |
Main Sputtering Chamber |
≤6.67×10-6Pa(after baking and degassing) |
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Sample Injection Chamber |
≤6.67×10-4Pa(after baking and degassing) |
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Regain Vacuum Time |
Main Sputtering Chamber |
6.6×10-4Pa after 40 min.(pumping after short-time exposed to air and filled with dry nitrogen) |
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Sample Injection Chamber |
6.6×10-3Pa after 40 min.(pumping after short-time exposed to air and filled with dry nitrogen) |
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Magnetron Target Module |
5 permanent magnet targets; sizeΦ60mm(one of the targets can sputtering ferromagnetic material).All the targets can RF sputtering and DC sputtering compatibly; and the distance between target and sample adjustable from 40mm to 80mm. |
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Water-cooling Substrate Heating Revolution Table |
Substrate Structure |
Six stations, heating furnace installed at one station, and the others are water cooling substrate station. |
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Size |
Φ30mm, six pics. |
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Mode of motion |
0-360°,reciprocate. |
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Heating |
Max. Temperature 600℃±1℃ |
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Substrate Negative Bias |
-200V |
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Gas Circuit System |
2-way Mass Flow Controller(MFC) |
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Sample Injection Chamber |
Sample Chamber |
Six simples one time |
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Annealer |
Max. heating temperature 800℃±1℃ |
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Resputtering Target Module |
Resputtering cleaning |
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Magnet Sample Send System |
Used for sample transporting between sputtering chamber and sample injection chamber. |
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Computer Control System |
Sample rotation, baffle open and shut, and target position control |
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Floor Occupied |
Main Set |
2600×900mm2 |
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Electrical Cabinet |
700×700mm2(two sets)
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